摘要
采用射频磁控溅射技术在改性氟塑料表面沉积铝层,制备了金属/氟化高聚物复合薄膜。利用场发射扫描电镜(FESEM)及能量散射谱(EDS)分析仪对沉积的铝层进行了表面形貌的表征和化学组分的分析。初步探讨了溅射功率、气压和时间等不同溅射参数对铝层结构和铝层在氟塑料表面附着情况的影响。结果表明:溅射功率是决定复合薄膜质量的重要因素,功率过低得不到致密的铝层结构,而且铝层容易从氟塑料表面脱离,功率过高则会产生很强的热效应而使复合薄膜弯曲。溅射气压和时间分别影响铝层在氟塑料表面的沉积速率和生长厚度。
Aluminum film was grown on modified fluorinated polymer composite films by rf magnetron sputtering. Surface morphology and composition of the A1 film were characterized with field emission scanning electron microscopy (FESEM) and energy dispersive spectroscopy (EDS) to optimize A1 film growth conditions.The results show that the sputtering power significantly affects the compactness of the A1 film. Low sputtering power results in less compact A1 film and weak inteffacial adhesion, whereas high sputtering power overheats and considerably bends the composite films. We found that sputtering pressure and sputtering time determine the deposition rate and thickness of the A1 film,respectively.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2005年第6期454-458,共5页
Chinese Journal of Vacuum Science and Technology
基金
国家863计划国防先进材料重大专项基金资助项目(No.2003AA305040)
关键词
改性氟塑料
磁控溅射
表面处理
复合薄膜
Modified fluorinated polymer, Magnetron sputtering, Surface treatment, Composed thin film