钛孔蚀过程中电化学振荡现象研究

STUDY ON Ti ELECTROCHEMICAL OSCILLATION DURING PITTING PROPAGATION

对钛孔蚀过程中的电位振荡现象进行了研究，考察了Ｂｒ－等阴离子、温度和电流密度等因素的影响。结果表明，电位振荡现象是由于蚀孔内形成盐膜所引起的。基于盐膜特性及试验结果。

The potential oscillation phenomena of Ti electrodes during its pitting propagation have been investigated in terms of current density, temperature, Br - and some other anions. Experimental results showed that the electrochemical oscillation was caused by the salt film formed within pits. The mechanism of the potential oscillation was discussed based on salt film characteristics and the experimental results.