紫外可见吸收光谱仪与椭偏测厚仪联用测量透明光电子薄膜的厚度

Thickness measurement of transparent optoelectronic films with combination of spectrometer and ellipsometer

采用椭偏测厚仪测量薄膜的折射率，用来修正紫外可见吸收光谱仪极值法测量膜厚的数据。通过制备掺铝氧化锌（ZAO）薄膜及SEM断口观察进行实验验证。证实该修正方法有助于提高膜厚测量精度。联用这2种常规仪器，可以方便地获得0～20μm宽范围的透明光电子薄膜的厚度。数据采集与处理简单快捷，可满足大部分薄膜工艺研究和生产的需要。

Ultraviolet-visible （UV） spectrometer can be used to measure the thickness of the single-iayer transparent optoelectronic films, where the result error can be corrected by using ellipsometer to measure the refractive index. The experiment of measuring the thickness of ZAO film and SEM fracture inspection proves that the method of correction is useful to improve the measurement preci- sion. Combining these two kinds of thicknessmeters, the thickness of films within 0～20 μm can be measured with enough accuracy. These methods are very practical for R＆D and production engineers to evaluate the growth rate and the quality of films with new structure.