光化学氧化法对阴离子表面活性剂降解的初步研究

Preliminary Study on the Degradation of Anionic Surfactants(LAS) in Wastewater by UV/H_2O_2 Oxidation

本试验采用UV/H2O2光氧化法处理含有较高浓度阴离子表面活性剂(LAS)的模拟废水,研究了H2O2投加量、pH值、光照时间、紫外灯光强对LAS降解率的影响。

The simulated wastewater with high concentration of I.AS was treated by UV/H2O2 oxidation.Factors affecting removal efficiency, such as the amounts of H2O2, pH value, the intensity of IN light, were studied and discussed.