摩擦电化学与摩擦电化学研磨抛光研究进展

Research Progress in Tribo-Electrochemistry and Tribo-Electrochemical Polishing

评述了水基介质和非水基介质中摩擦电化学的研究现状和进展,总结了摩擦电化学控制机理,进而在总结分析硬脆材料研抛机理的基础上提出摩擦电化学研抛原理,指出摩擦电化学研抛可望成为微电子基材高效研抛与平坦化的关键技术.

A review is given on the current state and recent progress in the research of tribo-electrochemistry in aqueous media and non-aqueous media, respectively, with special attention being paid to the triboelectrochemical mechanisms for the control of friction and wear. Along with a summary on the conventional polishing principles of hard and brittle materials, the tribo-electrochemical polishing method is proposed. Preliminary test results show that tribo-electrochemical polishing is promising to become the critical technology in the high efficient polishing and planarization of microelectronic materials.