EB-PVD制备箔材的厚度均匀性研究

Study of Foil Thickness Uniformity Prepared in EB-PVD

从真空蒸镀中使用的小平面蒸发源理论出发,针对电子束物理气相沉积中为改善箔材厚度分布所须旋转大基板进行蒸镀的情况,建立了该过程的数学模型;并利用该模型对不同的坩埚位置所沉积的箔材厚度进行了定性分析,从而实现了对坩埚与基板相对位置的优化,使基板上沉积的箔材厚度分布可以达到最均匀的状态。最后通过K值的提出使理论和实际箔材厚度的结果趋于一致,即证明所建立的数学模型是合理的。

A mathematical model of foil thickness distribution used for electron beam physical vapor deposition technology is presented by taking the evaporation on big and rotary substrate and improvement of foil thickness uniformity into consideration. The theory of small plate evaporation source under the condition of vacuum evaporation is used in this model. Using this model, qualitative analysis of foil thickness relative to different crucible position is done. The relative position between crucible and substrate is optimized in fact so that the foil thickness deposited on the substrate is the considerably uniform. At last, the theoretic foil thickness and experimental foil thickness tend to be identical through presenting K. It is shown that mathematical model is reasonable.