Cr-Si-Ni电阻薄膜在酸碱溶液环境中的电学稳定性

Electrical stability of Cr-Si-Ni resistive films in acidic and alkaline aqueous solutions

采用磁控溅射方法制备了Cr-Si-Ni电阻薄膜,研究了薄膜在模拟酸性(0.1 mol/L HCl)和碱性(0.1 mol/L NaOH)溶液环境中的电学稳定性和长期使用可靠性。结果表明:在室温(25℃)时,500℃热处理后的纳米晶结构薄膜在酸性溶液环境中比在碱性溶液环境中具有更优异的电学稳定性和长期使用可靠性。在酸碱两种溶液中浸泡240 h后,薄膜试样的相对电阻变化(ΔR/R)分别为0.96%和3.31%。电化学实验和AES表面成分分析表明,在酸碱两种溶液中薄膜表面都能够形成致密稳定的SiO2保护层,而且酸性环境形成的钝化膜比碱性环境形成的钝化膜具有更好的腐蚀保护作用。

Cr-Si-Ni resistive films were prepared by magnetron sputtering. Electrical properties stability and longterm reliability of the films in 0. 1 mol/L HCl and 0.1 mol/L NaOH aqueous solutions were investigated, which simulated acidic and alkaline environments. The results reveal that the nanocrystalline films by annealing at 500 ℃ in acidic environments present much more excellent electrical stability and good long-term reliability than the films in alkaline environments at 25 ℃. After immersing the films in two solutions for 240 h, the relative resistance change （△R/R） of the films is 0.96% and 3.31%, respectively. The electrochemical measurements and AES results indicate that the surface of the films can both form a dense and stable SiO2 protective layer in acidic and alkaline solutions, and that the passive film in acidic environments exhibits much more protective effects on the films than that in alkaline environments.