碳源流量对碳纳米管厚膜形貌和结构的影响

Acetylene Flow Rate Effect on Morphology and Structure of Carbon Nanotube Thick Films by Low Pressure Chemical Vapor Deposition

采用低压化学气相沉积(LPCVD)在镍片上制备了厚度在400-1000μm范围的碳纳米管(CNTs)薄膜,研究了碳源(乙炔)流量对碳纳米管薄膜形貌和结构的影响．随乙炔流量的增加,碳纳米管薄膜厚度和产量增大．电子显微镜和拉曼光谱研究结果表明,在乙炔流量为 10sccm下制备的碳纳米管直径分布范围最小(10—100nm),石墨化程度最高,缺陷密度最小, 晶形最完整．随着乙炔流量的增大(30-90sccm),碳纳米管的直径分布范围增大(10-300nm), 石墨化程度降低,缺陷密度增大,非晶化程度增加．因此,通过碳源流量可以控制碳纳米管薄膜的形貌和结构．

Carbon nanotube （CNT） films were prepared on nickel foil substrates by low pressure chemical vapor deposition （LPCVD） with acetylene and hydrogen as the precursors. The effect of acetylene flow rate on the morphology and structure of CNT films was investigated. The morphology and structure of CNTs depending on the acetylene flow rate were characterized by scanning electron microscope, transmission electron microscope and Raman spectroscope, respectively. With increasing the acetylene flow rate from 10 to 90sccm, the growth rate of CNT films increases and the thickness increases from 400 to 1000μm, while the diameter of the CNTs increases from 10 to 300nm. Also, the defects and amorphous phase in the CNT films increase with increasing the acetylene flow rate.