Ge薄膜X光激光靶的研制

THE PREPARATION OF GERMANIUM FOIL X-RAY LASER TARGET

针对Ｇｅ薄膜应力较大的特点，采用热蒸发方式制备Ｇｅ膜。研究了不同脱膜剂和基片温度对Ｇｅ膜结构的影响。采用新的反粘脱膜工艺，制备出了比较满意的Ｇｅ薄膜靶。

In accordance with strong internal stress of germanium foil, the foil is prepared on glass substrate with different removers using thermal evaporation technique. The structures of foil derived from different preparation process are analysed. A new remover and a special process are used to obtain germanium foil targets with high quality.