摘要
在加衬底偏压和不加衬底偏压两种情况下,用微波等离子体化学汽相沉积(M3VCVD)技术在Si(100)衬底上合成了织构的金刚石薄膜使用扫描电子显微镜(SEM)和取向X射线衍射技术证实了我们得到的样品是织构的金刚石薄膜观察了织构的金刚石薄膜的成核和生长过程。
Textured diamond films were depsited on (100 ) Si substrates via microwave plasmaCVD (MWCVD) with bias - enhanced nucleation or without substrate bias. The sampleswere identified by means of scanning electron microscopy (SEM) and X ray diffraction(XRD) to be textured. The nucleation and growth process of textured diamond films wereinvestigated, the mechanism of nucleation and growth were discussed.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
1996年第1期88-93,共6页
Acta Physica Sinica