Ni／NiO界面的高场磁化研究

APPROCHING TO SATURATION OF Ni/NiO INTERFACE

报道在表面包覆ＮｉＯ的Ｎｉ超微颗粒和Ｎｉ／ＮｉＯ多层膜中Ｎｉ／ＮｉＯ界面的磁性实验结果．在Ｔ＜８０Ｋ下Ｎｉ／ＮｉＯ界面存在较大的磁化强度（Ｈ＝４０ｈＯｅ），并随温度上升而快速下降．对高场磁化（５－６５ｈＯｅ）实验数据进行拟合，结果表明Ｎｉ／ＮｉＯ界面存在类似磁矩排列不一致的结构．

The magnetic properties investigated by experiment on the Ni/NiO interface of Ni/NiOmulti-thin layers and surface-NiO-coated Ni ultra fine particles are reported. At temperaturesbelow 80 K, an abnormal enhanced magnetization under external magnetic 'field (H = 40hoe) was found. The enhanced magnetization decreases quickly with temperature increasing.The high field (5-65 hOe) magnetization (approching to saturation) of ultrafine particlesand multi-thin layers were also measured. The fit results for experimental data indicate thatthe interface Ni/NiO in Ni/NiO UFP and Ni/NiO ML have inhomogenous spin structure.