制备CdTe多晶薄膜升温过程的研究

A studies of the increasing-temperature process of CdTe polycrystalline films preparation

采用近空间升华沉积法CSS(Close space sublimation),在3种不同升温过程中沉积制备CdTe多晶薄膜,通过实验数据作出其升温曲线,采用扫描电镜(SEM)、X射线衍射(XRD)、微电流高阻计等方法对沉积膜的性能进行测试分析．研究了在CSS法中控制升温过程对CdTe生长沉积机制及其沉积质量的影响．结果表明升温过程对CdTe多晶薄膜的沉积过程有重要的影响．其中,以氢气刻蚀后拉开衬底与升华源之间的设定温差,并保持固定温差至设定温度的升温过程的沉积质量最佳．

A closed-space sublimation technology is used to prepared CdTe polycrystalline thin films on the three different temperature-increasing processes. The performance of the CdTe thin film was investigated by scanning electron microscopy （SEM） and X-ray diffraction （XRD）. In the paper, the effects of curves of increasing temperature to the CdTe films growing in CSS were studied and increasing temperature curves have been optimized. The results showed that temperature-increasing process has very important influence in depositing CdTe polycrystalline thin films in CSS. Among them, the best method is that which pulls difference in temperature first and keeps difference in temperature to the initialization temperature.