摘要
采用多靶磁控溅射法制备了一系列具有不同Al2O3调制层厚度的TiN/Al2O3纳米多层膜.利用X射线能量色散谱、X射线衍射、扫描电子显微镜、高分辨透射电子显微镜和微力学探针表征了多层膜的成分、微结构和力学性能.研究结果表明,在TiN/Al2O3纳米多层膜中,单层膜时以非晶态存在的Al2O3层在厚度小于1·5nm时因TiN晶体层的模板效应而晶化,并与TiN层形成共格外延生长,相应地,多层膜产生硬度明显升高的超硬效应,最高硬度可达37·9GPa.进一步增加多层膜中Al2O3调制层的层厚度,Al2O3层逐渐形成非晶结构并破坏了多层膜的共格外延生长,使得多层膜的硬度逐步降低.
TiN/Al2O3 nanomuhilayers with various Al2O3 layer thicknesses were prepared by multi-target magnetron sputtering. The chemical composition, microstructure and mechanical properties of these muhilayers were characterized by energy dispersive X- ray spectrometry, X-ray diffraction, high-resolution transmission electron microscopy and nanoindentation. The result raveals that under the sputtering conditions, normally amorphous A12 03 is forced to crystallize at very small layer thicknesses ( 〈 1.5 nm), and grows coherently and epitaxially over TiN layers. Correspondingly, the hardness of the muhilayers increases significantly and reaches a maximum value of 37.9 GPa. Further increasing in layer thickness, Al2O3 layers form an amorphous structure and block the coherent growth of the muhilayers, and thus the hardness decreases gradually.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2006年第2期770-775,共6页
Acta Physica Sinica
基金
上海市专利技术再创新基金(批准号:037252052)资助的课题.~~
关键词
TiN/Al2O3
纳米多层膜
外延生长
非晶晶化
超硬效应
TiN/Al2O3 nanomuhilayers, epitaxial growth, template-induced crystallization, superhardness effect