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(Ti,Al)N涂层的微观组织和性能 被引量:19

Microstructure and properties of (Ti,Al) N coating
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摘要 采用EPMA、XRD、SEM、TEM、HR-TEM、EDX、纳米压痕、氧化实验和切削实验研究了磁控溅射在硬质合金基体上沉积TiN涂层和(Ti,Al)N涂层的微观组织结构和性能。结果表明:TiN涂层晶粒为喇叭口柱状晶,(Ti,Al)N涂层为面心立方平直柱状晶,由于固溶了Al元素,(Ti,A l)N涂层呈(200)面择优生长;(Ti,Al)N涂层在硬质合金基体上无外延生长;(Ti,Al)N涂层在800℃氧化后形成Al2O3/TiO2/(Ti,Al)N的分层结构;(Ti,Al)N涂层具有更高的硬度和更好的切削性能。 The properties of magnetron sputtered TiN and (Ti, Al)N coatings grown on cemented carbide substrates were studied by electron probe microanalysis (EPMA), X-ray diffractometry (XRD), scanning electron microscopy (SEM), nanoindentation, energy dispersive X-ray spectroscopy (EDX), oxidation experiment and cutting tests. The results show that TiN coating is bell mouth columnar structures and (Ti, Al)N coating is fcc straight columnar structures. The (Ti, Al)N coating shows a fairly strong (200) preferred orientation because Ti atoms in the TiN lattice are substituted by Al atoms. The epitaxial growth is not found between (Ti, Al)N coating and substrate. The (Ti, Al)N coating becomes Al2O3/ TiO2/(Ti, Al)N multilayer after oxidated at 800℃. The (Ti, Al)N coating exhibits higher hardness, excellent cutting performance compared with TiN coating.
出处 《中国有色金属学报》 EI CAS CSCD 北大核心 2006年第2期279-283,共5页 The Chinese Journal of Nonferrous Metals
关键词 (TI AL)N涂层 硬质合金 外延生长 氧化性能 切削性能 (Ti, Al)N coating cemented carbide epitaxial growth oxidation properties cutting properties
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  • 1Diserens M,Patscheider J,Levy F.Improving the properties of titanium nitride by incorporation of silicon[J].Surface and Coatings Technology,1998,108-109(1-3):241-246.
  • 2Plamers J,Stappen M V.Deposition of (Ti,Al)N coatings by means of eletron beam ion plating with evaporation of Ti and Al from two separate crucibles[J].Surface and Coatings Technology,1995,76-77(1):363-366.
  • 3Li D,Chu X,Cheng S C,et al.Synthesis of superhard carbon nitride composite coatings[J].Applied Physics Letters,1995,67(4):203-205.
  • 4Veprek S,Nesladek P,Niederhofer A,et al.Recent progress in the superhard nanocrystalling composites:towards their industrialization and understanding of the origin the superhardness[J].Surface and Coatings Technology,1998,108-109(1-3):138-147.
  • 5Schneider J M,Sproul W D.Reactive pulsed dc magnetron sputtering and control[J].Handbook of Thin Film Process Technology,1998,A5:1-12.
  • 6Musil J,Hruby H.Superhard nanocomposite Ti1-x-AlxN films prepared by magnetron sputtering[J].Thin Solid Films,2000,365(1):104-109.
  • 7Lux B,Colombier C,Altena H,et al.Preparation of alumina coatings by chemical vapour deposition[J].Thin Solid Films,1986,138(1):49-64.
  • 8Hultman L.Thermal stability of nitride thin films[J].Vacuum,2000,57(1):1-30.
  • 9Wadsworth I,Smith I J,Donohue L A,et al.Thermal stability and oxidation resistance of TiAlN/CrN multilayer coatings[J].Surf Coat Technol,1997,94-95:315-321.
  • 10Coll B F,Fontana R,Gates A,et al.(Ti,Al)N advanced films prepared by arc process[J].Mater Sci Eng A,1991,A140(1):816-824.

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