摘要
介绍了一种广泛应用于离子刻蚀、预清洗和离子束辅助镀膜的阳极层离子源的工作原理,分析了磁场对其性能的影响。给出了线性阳极层离子源磁路的设计。采用ANSYS有限元分析软件对线性阳极层离子源的静态电磁场进行了模拟分析,并与实验结果进行了比较,结果令人满意。通过ANSYS编码对电磁场模拟,可为具体的阳极层离子源的改进设计提供指导。
The principle of anode layer ion source for etching, pre-cleaning and ion beam assisted deposition was described. The influence of the magnetic field on the performance of anode layer ion source was analyzed. Design of the magnetic loop for the linear anode layer ion source was given. The electromagnetic field distribution of the ion source was simulated by means of ANSYS code and the simulation results were in agreement with experimental ones. The numerical simulation results of the electromagnetic field are useful for improving the anode layer ion source.
出处
《核聚变与等离子体物理》
EI
CAS
CSCD
北大核心
2006年第1期54-58,共5页
Nuclear Fusion and Plasma Physics
关键词
阳极层离子源
等离子体预清洗
离子束辅助沉积
电磁场
数值模拟
Anode layer ion source
Plasma pre-cleaning
Ion beam assisted deposition
Electromagnetic field
Numerical simulation
