高质量非晶金刚石薄膜的制备研究

Investigation on the Preparation of High Quality Amorphous Diamond Films

利用自行研制的磁过滤等离子体技术（FCAP），并创造性地对衬底施加低频率周期性负偏压，在室温下的单晶硅表面上制备了高质量的非晶金刚石薄膜。用扫描电子显微镜（SEM），原子力显微镜（AFM），红外吸收光谱（IR），纳米硬度计和摩擦试验仪对制备的非晶金刚石薄膜进行了结构和性能表征。实验结果表明：制备的非晶金刚石薄膜表面十分光滑，表面粗糙度仅为0．1nm；薄膜中sp^3键成份高达70．7％，对应薄膜硬度达到74．8GPa，接近金刚石的硬度；薄膜摩擦系数在0．12-0．16之间。文中也讨论了偏压类型对沉积薄膜结构的影响。

The high quality DLC films were successfully deposited on the surface of silicon substrates at room temperature by the filtered cathodic arc plasma （FCAP） equipment. The results show that the substrate bias plays a crucial role in the sp^3 component in DLC film and so affects the quality of the films. Analysis of AFM and IR spectrum demonstrate that the films are of typical characteristic of DLC. The DLC films have excellent mechanical properties, whose hardness is 74. SPa and friction coefficient is 0.12-0.16 ,much better than substrate materials. Theoretical analysis for the film formation fitted well with experimental results.