用镀有钛过渡层的钼衬底制备无裂纹自支撑金刚石膜

Deposition of Crack-free Freestanding Diamond Films on Mo Substrates with Ti Interlayer

为了解决金刚石膜脱膜开裂的问题,尝试了一种复合衬底,即镀有钛过渡层的钼衬底。利用直流等离子体喷射法在复合衬底上制备了不同厚度无裂纹的自支撑金刚石膜。用扫描电镜(SEM)、拉曼谱和X射线衍射表征金刚石膜的特征,并检测了其断裂强度。结果表明,用复合衬底制备的金刚石膜在950℃具有最小半高宽,在实验温度下所获得的金刚石自支撑膜的断裂强度均超过了500MPa。

A type of composite substrate was explored to solve the problem of crack in the deposition of diamond films, that is, Mo substrates with Ti interlayer. Crack-free freestanding diamond films with different thicknesses can be deposited on composite substrates by DC plasma jet. The diamond films were investigated with SEM, Raman and X-ray diffraction. In addition, the fracture strength of these films was measured. The results demonstrate that the diamond films deposited at 950~C and on the composite substrate have the least fuU wave at half maximum （FWHM）, and the fracture strength of the diamond films deposited at the experimental temperature exceeds 500MPa.