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用近红外成像技术检测硅晶片中的裂纹 被引量:1

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摘要 硅晶片是微电子工业的基本建筑模块。用于制备集成电路的硅晶片的尺寸在稳步增大,因为晶片越大,每一加工步骤中所产生的部件也就越多.当晶片的直径增加到300mm或者更大时,它们就会变得越来越容易损坏,而且在制造期间容易受到产生的应力的影响。
作者 高国龙
出处 《红外》 CAS 2006年第3期46-47,共2页 Infrared
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  • 2Lopes M. B., Wolff J. C., Bioucas-Dias J. M., Figueiredo M. T. Near-Infrared hyperspectral unmixing based on a Minimum Volume Criterion for fast and accurate chemometric characterization of counterfeit tablets. Anal. Chem., 2010, 82:1462-1469.
  • 3Tsuta M., Sugiyama J., Sagara Y. Near-infrared imaging spectroscopy based on sugar absorption band for melons. Journal of Agricultural and Food Chemistry. 2002, 50:48-52.
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  • 7Fernandes A. M., Oliveira P., Moura J. P., Oliveira A. A. Determination of anthocyanin concentration in whole grape skins using hyperspectral imaging and adaptive boosting neural networks. Journal of Food Engineering, 2011, 105:216--226.
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  • 10Ariana D. P., Lu R. F. Evaluation of internal defect and surface color of whole pickles using hyperspectral imaging. Journal of Food Engineering, 2010, 96:583-590.

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