摘要
对磷烷的合成、净化等方法进行了详细的介绍,指出随着IC制造业的发展,传统的磷烷净化工艺已成为历史,新的净化方法在原理上同以往的工艺有着本质的区别。吸附—低温精馏—超纯终端净化联合工艺是当今磷烷生产的发展方向,指出了我国未来几年电子气体净化需要克服的技术“瓶颈”。
The synthesis and purification of PH3 are introduced detailed, it is pointed out that with the development of IC manufacturing industry, traditional purification process of PH3 that essentially differ from new purification process in theory will mean an end, Combination of adsorption, distillation and ultra-pure terminal purification will be the trend of the production of PH3. The key technical difficulties that should be overcome in the purification of electronic gases in the future in China are suggested.
出处
《低温与特气》
CAS
2006年第1期27-29,共3页
Low Temperature and Specialty Gases
基金
国家资金支持研究项目
关键词
磷烷
合成
吸附
低温精馏
超纯净化
phosphine
synthesis
adsorption
cryogenic distillation
ultra-pure purification
