摘要
薄膜抛光技术是超精密磨削领域中一种新兴的磨削技术。文中以MCS51系列单片机为核心,结合研磨抛光薄膜以及自制便携式抛光机的特点,设计开发了薄膜抛光实验的测力平台。该平台主要用于薄膜抛光过程中磨削力的实时监测,分析磨削力对抛光精度的影响,有助于研究抛光膜损伤机理与磨削力、工艺参数之间的关系。
The polishing technology of membrane is a new griding technology in the field of ultra-precision manufacture. According to the characteristics of grinding polishing film and portable polishing machine made by ourselves, this paper has designed and devedloped a polishing experiment platform on the basis of MCS51 series. The platform is used to monitor the grinding strength in the course of polishing. It would be helpful to study the relation among abrasion mechanism. grinding strength and technology parameters by analyzing the influence of the strength to the polisbing precision.
出处
《机械工程师》
2006年第3期77-79,共3页
Mechanical Engineer
基金
上海市曙光计划资助项目(03SG45)
关键词
薄膜抛光
单片机
实验平台
kpolishing film
single chip micyoco
experiment platform
