紫外光/臭氧干法去除光刻胶速率的提高

Rate Enhancement of UV/Ozone Dry Depolymerization of Photoresists

本文讨论影响紫外光/臭氧干法去除光刻胶速率的几个因素、提高去胶速率的途径。在此基础上,介绍一种新型的实验装置以及应用该装置进行实验的结果。

This paper discusses several factors influencing the UV/ozone dry depolymerization rateand the ways enhancing the depolymerization rate of photoresists.A new type apparatus andthe experimental results obtained with this apparatus are described.