期刊文献+

步进闪光压印光刻模具制作工艺研究 被引量:5

Template Fabrication Process in Step and Flash Imprint Lithography
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摘要 由于硅橡胶具有良好的自适应性和优异的脱模性,所以选取硅橡胶作为模具材料,并确定使用硅橡胶加石英硬衬作为压印光刻工艺的模具.分析了硅橡胶模具制作工艺中真空辅助浇铸的成型过程,以及交联固化反应过程的各个工艺参数对硅橡胶模具性能的影响,通过大量实验,具体分析了硅橡胶单体和固化剂配比、浇铸真空压力、固化温度及固化时间等工艺参数,并由此得到了优化的硅橡胶固化工艺参数,提高了硅橡胶模具的物理性能.实验表明,硅橡胶模具具有良好的自清洁功能,其表面图形完好,图形转移效果优异,完全能够满足300 nm特征尺寸图形复型转移压印的要求. A process of fabricating mold applied to step and flash imprint lithography is described. Sili- cone is chosen to serve as the patterning material due to its fine self-adaptability and easy demolding character. The mold is made of the silicone pattern layer with a quartz supporting plate. The parameters in a vacuum casting process and a hardening process for composing the silicone are optimized to improve the physical properties of the mold to keep adequate demold and pattern accuracy. It is experimentally shown that the mold enables to meet the requirements for patterning sub-micrometer structures with satisfied self-cleaning and pattern transferring capacity.
出处 《西安交通大学学报》 EI CAS CSCD 北大核心 2006年第3期337-340,共4页 Journal of Xi'an Jiaotong University
基金 国家重点基础研究发展计划资助项目(2003CB716203) 国家自然科学基金资助项目(50275118) 国家高技术研究发展计划资助项目(2002AA420050)
关键词 压印光刻 硅橡胶 模具 imprint lithography silicones template
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参考文献8

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同被引文献107

  • 1司卫华,董晓文,顾文琪.紫外压印模版的制备[J].微细加工技术,2007(2):5-8. 被引量:1
  • 2范东升,谢常青,陈大鹏.纳米压印光刻模版制作技术[J].电子工业专用设备,2005,34(2):26-32. 被引量:6
  • 3邵金友,丁玉成,卢秉恒,王莉,刘红忠.压印光刻对准中阻蚀胶层的设计及优化[J].西安交通大学学报,2006,40(9):1045-1048. 被引量:2
  • 4陈雷明,郭艳峰,郭熹,唐为华.改性光刻胶制备纳米压印模版[J].物理学报,2006,55(12):6511-6514. 被引量:3
  • 5丁玉成,刘红忠,卢秉恒,李涤尘.下一代光刻技术——压印光刻[J].机械工程学报,2007,43(3):1-7. 被引量:13
  • 6CHOI W M, PARK O O. A soft-imprint technique for direct fabrication of submicron Scale patterns using a surface-modified PDMS mold[J]. Microelectronic Engineering, 2003, 70: 131-136.
  • 7PLACHETKA U, BENDER M, FUCHS A, et al Comparison of multilayer stamp concepts in UV-NIL[J] Microelectronic Engineering, 2006, 83.. 944-947.
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  • 9KOO N, BENDER M, PLACHETKA U, et al. Improved mold fabrication for the definition of high quality nanopatterns by Soft UV-Nanoimprint lithography using diluted PDMS material[J]. Microelectronic Engineering, 2007, 84. 904-908.
  • 10KIM K D, JEONG J H, ALI A, et al. Replication of an UV-NIL stamp using DLC coating[J]. Microelectronic Engineering, 2007, 84.. 899-903.

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