摘要
以苯基三氯硅烷、二甲基二氯硅烷为原料,利用伍兹反应使其共聚生成聚(苯基-二甲基)硅烷。在不同投料比下,发现枝化度越高,聚合物分子量越小,分子量分布越宽,产率越高;并用红外光谱及29Si-NMR谱对其结构进行表征,用紫外光谱和热失重表征其光学性质和热稳定性,发现聚合物在211 nm处有尖锐吸收峰,并拖尾至380 nm处,热分解温度约在500℃左右,高于一般的线形聚硅烷。
We have prepared a kind of branched poly （phenyl - dimethyl）silane using phenyl - trichlorosilane and dimethyi- dichiorosilane by Wurtz- type coupling reaction. And find that its molecular weight and distribution have relation with the product＇s degree of branching,according to different feeding ratio. Infrared spectrum and ^29Si- NMR spectrum were used to confirm its chemical structure. UV spectrum and TG were used to examine its optical propcrty and thermal stability. We find that it has strong absorbance at 211 nm and extends to 380 nm,and its thermal degradation temperature is about 500 ℃, which higher than uormal linear polysilanes.
出处
《弹性体》
CAS
2006年第1期13-15,共3页
China Elastomerics
基金
湖北省教育厅基金重点资助项目(020-094110)
关键词
枝状聚硅烷
合成
光电材料
branched polysilane
synthesis
photoclectric material
