摘要
介绍了光刻胶的性能和反应机理,建立了光刻模型,讨论了曝光和显影对信息符的综合影响并对信息符形貌进行了仿真,着重分析刻录激光光斑能量分布对不同周期记录符的影响。以Shipley AZ-1350光刻胶和相应的显影液以及DVD母盘的生产为例,验证了仿真的正确性。
The property and reaction mechanism of the photoresist was introduced. The mastering model is then built on that base we discuss the effect of exposure and develop and simulate the formation of the recording mask. The energy distribution of mastering laser is emphasized because of its effect on the different period recording mask. In our experiments,we take the Shipley AZ-1350 photoresist and developer as examples in the production of dvd read-only disk mastering,which matches the simulation.
出处
《光电子．激光》
EI
CAS
CSCD
北大核心
2006年第3期265-268,共4页
Journal of Optoelectronics·Laser
基金
国家"973"重点基础研究资助项目(G19990330)
关键词
母盘
抗蚀剂
曝光
显影
master
photoresist
exposure
develop
