摘要
简单概述了浸没式ArF的发展历史、特点和面临的科学技术问题,在跟踪报道国内外最新研究进展的同时,介绍前沿光刻技术的研发特点和研究手段,强调协同设计研究的重要地位,并揭示浸没式ArF光刻不是干式ArF光刻的简单移置和延续。
Outline of the history, features and challenges of immersion ArF lithography is given in this paper. The most recent development of immersion ArF lithography is presented by tracing recent publications and news, The method and trace of R & D in advanced lithography area is introduced which reveals that the co-design is the most important. These also prove that immersion ArF lithography and dry ArF lithography are significant different.
出处
《电子工业专用设备》
2006年第3期27-35,共9页
Equipment for Electronic Products Manufacturing
基金
国家863项目
973项目(No.2003CB716204.)的资助