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磁控溅射制备参数对ZnO:Al电学性能的影响

Effect of Magnetron Sputtering Growth Parameters on Electrical Properties of ZnO:Al
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摘要 ZnO:Al(ZAO)透明导电薄膜是一种n型半导体,有高的载离子浓度和大的光学禁带宽度,具有优异的电学和光学性能,有极广的应用前景.本文介绍了ZAO薄膜的广泛用途和今后研究的趋势,并着重分析了磁控溅射制备参数对电学性能的影响. Transparent conductive ZnO: Al(ZAO) thin films are semi-conductor oxides with both high carrier concentration and large optical band gap. ZAO films have outstooding electrical and optical properties, and are emerging as a most potential alternative candidate for transparent conducting material. The applications and the proposal for the future research of ZAO are described. The effect of growth parameters on the properties are mostly analysed.
出处 《淮北煤炭师范学院学报(自然科学版)》 2006年第1期16-21,共6页 Journal of Huaibei Coal Industry Teachers College(Natural Science edition)
基金 重庆市教委科研基金资助项目(040810)
关键词 ZAO薄膜 电学性能 磁控溅射 ZAO films electrical properties magnetron sputtering
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