氮离子注入TiNi形状记忆合金表面改性

Surface modification of TiNi shape memory alloy by nitrogen ion implantation

采用1×1016ions/cm2的注入剂量对TiNi形状记忆合金进行氮离子注入,注入加速电压为50 keV。采用X射线衍射和X射线光电子能谱对氮离子注入前后TiNi形状记忆合金表面的物相以及化学成分进行了分析。结果表明,氮离子注入前后TiNi合金表面都被氧化。氮离子注入前TiNi形状记忆合金表面存在少量TiO2、Ti3O5和Ti2O3。氮离子注入后的TiNi形状记忆合金表面有TiN新相生成,且在氮离子注入后的TiNi形状记忆合金表面还存在少量TiO2、Ti3O5。

TiNi shape memory alloy samples were nitrogen-ion implanted with the implantation dose of 1×10^16 ions/cm^2 and the acceleration voltages of 50 keV. X-ray diffraction analysis and X-ray photoelectron spectroscopy analysis were used to characterise the phase, the chemical composition and chemical state of the surface layer of the TiNi alloy samples and nitrogen-ion-implanted TiNi alloy samples. The results show that the surfaces of the TiNi al- loy and nitrogen-ion-implanted TiNi alloy are all oxidized. TiO2, Ti2O3 and Ti3O5 exist on the TiNi sample surface. New phase TiN is produced on the surface of the nitrogen-ion-implanted TiNi sample, and there also exist small amounts of TiO2 and Ti3O5 on the nitrogen-ion-implanted TiNi sample surface.