期刊文献+

一种模拟倾斜折射率界面光波导的新方法 被引量:3

A highly efficient beam propagation method for modeling step-index waveguides with tilt interface
原文传递
导出
摘要 针对传统离散格式下,束传播方法(BPM)模拟倾斜折射率界面出现的问题,提出了一种简明且易于编程实现的改进方案.在横向上,通过坐标系变换和插值处理,以新颖的7点差分格式代替传统的5点差分方式;在纵向上,以四阶显式Runge_Kutta方法(RKBPM)代替二阶Crank_Nicholson算法(CNBPM),避免了求解不规则矩阵方程,从而使计算效率显著提高. Based on a new finite-difference scheme and Runge-Kutta method together with transparent boundary conditions(TBCs), a novel beam propagation method to model step-index waveguides with tilt interfaces is presented. The modified scheme provides an precies description of the tilt interface of the nonrectangular waveguide structure, showing a much better efficiency and accuracy comparing with the previously presented formulas.
出处 《物理学报》 SCIE EI CAS CSCD 北大核心 2006年第3期1023-1028,共6页 Acta Physica Sinica
基金 国家高技术研究发展计划(批准号:2002AA312060) 国家重点基础研究发展计划(批准号:G20000366)资助的课题.~~
关键词 束传播方法 RUNGE-KUTTA方法 光波导 脊形波导 BPM, Runge-Kutta method, optical waveguide, rib waveguide
  • 相关文献

参考文献13

  • 1Kim C M, Ramaswamy R V 1989 J. Lightwave Technol, 7 1581.
  • 2Yee K S 1996 IEEE Trans. Antennas Propagat, 4 302.
  • 3Yoneta S, Koshiba M, Tsujl Y 1999 J. Lightwave Technol. 11 2398.
  • 4Hsueh Y L, YangM C, Chang H C 1999 J. Lightwave Technol. 17 2389.
  • 5夏金松,余金中.一种新的基于最小平方逼近的广角光束传播方法[J].物理学报,2003,52(3):515-521. 被引量:5
  • 6Yamauchi J, Sckiguchi M, Takahashi G et al 1998 IEEE Photonics Technology Letter 10 1127.
  • 7Ando T, Nakayama H, Numata S et al 2002 J. Lightwave Technol.20 1627.
  • 8Chiang Y C, Chiou Y P, Chang H C 2002 J. Lightwave Teehnol.20 1609.
  • 9Xia J S, Yu J Z 2003 IEEE Photoaics Technology Letters 15 1237.
  • 10Chung Y, Dagli N 1990 IEEE J. Quantum Electron. 26 1335.

二级参考文献10

  • 1[2]Feit M D and Fleck J A Jr 1978 Appl. Opt. 17 3990
  • 2[3]Kim C M and Ramaswamyeling R V 1989 J. Lightwave Technol. 7 1581
  • 3[4]Lee P C, Schulz D and Voges E 1992 J. Lightwave Technol. 10 1832
  • 4[5]Lee P C and Voges E 1994 J. Lightwave Technol. 12 215
  • 5[6]Hsueh Y L, Yang M C and Chang H C 1999 J. Lightwave Technol. 17 2389
  • 6[7]Fogli F, Bellanca G, Bassi P, Madden I and Johnstone W 1999 J. Lightwave Technol. 17 136
  • 7[8]Liu X Y 2000 Acta Phys. Sin. 49 186(in Chinese) [刘新芽 2000 物理学报 49 186]
  • 8[9]Hadley G R 1992 Opt. Lett. 17 1426
  • 9[10]Hadley G R 1992 IEEE J. Quantum Electron. 28 363
  • 10[11]Scarmozzino R, Gopinath A and Helfert S 2000 IEEE J. Selected Topics Quantum Electron. 6 150

共引文献4

同被引文献18

  • 1赵谦,潘教青,张靖,周光涛,伍剑,周帆,王宝军,王鲁峰,王圩.超低压选择区域生长法制备产生10GHz重复率超短光脉冲的级联电吸收调制器与分布反馈激光器单片集成光源[J].物理学报,2006,55(1):261-266. 被引量:4
  • 2Yablonnovitch E.Inhibited spontaneous emission in solidstate physics and electronics.Phys Rev Lett,1987,58:2059
  • 3John S.Strong localization of photons in certain disordered dielectric superlattices.Phys Rev Lett,1987,58:2486
  • 4Loncar M,Doll T,Vuckovic J,et al.Design and fabrication of silicon photonic crystal optical waveguides.J Lightwave Technol,2000,18:1402
  • 5Chutinan A,Noda S.Waveguides and waveguide bends in two-dimensional photonic crystal slabs.Phys Rev B,2000,62:4488
  • 6Chang T H P.Proximity effect in electron-beam lithography.J Vac Sci Technol,1975,12:1271
  • 7Wuest R,Strasser P,Jungo M.An efficient proximity-effect correction method for electron-beam patterning of photoniccrystal devices.Microelectron Eng,2003,67:182
  • 8Kjellberg T,Schatz R.The effect of stitching errors on the spectral characteristics of DFB lasers fabricated using electron beam lithography.IEEE J Lightwave Technol,1992,10:1256
  • 9Murakowski J,Schneider G,Prather D W.Combination lithography for photonic crystal circuits.Proc SPIE,2003,5000:43
  • 10Albert J,Theriault S,Bilodeau F.Minimization of phase errors in long fiber Bragg grating phase masks made using electron beam lithography.IEEE Photonics Technol Lett,1996,8:1334

引证文献3

二级引证文献2

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部