多层膜界面粗糙度的低角X射线衍射研究

STUDY OF MULTILAYER INTERFACE ROUGHNESS BY LOW-ANGLE X-RAY DIFFRACTION

对磁控溅射方法制备的Ｗ／Ｓｉ周期多层膜在Ｘ射线衍时仪上进行了低角Ｘ射线衍射实验，并用动力学理论分析了膜层的周期结构和界面粗糙度，在对实验谱线的拟合过程中，考虑了界面的不对称性、周期的随机涨落及系统偏差等因素对衍射强度的影响，并讨论了各个参量对衍射强度影响的程度．

W/Si multilayer for soft X-ray optics was deposited by magnetron sputtering. The periodicity and interface roughness of the multilayer were studied by low-angle X-ray diffraction at a X-ray diffractometer, and analyzed with dynamical theory of X-ray diffraction. Good fitting between simulational and experimental curve has been obtained with a model that allows for interface asymmetry.