摘要
本文报导了在用热阴极直流放电等离子体化学气相沉积（通常也称ＥＡＣＶＤ．即电子辅助化学气相沉积）方法合成金刚石的条件下的等离子体密度、电子温度、等离子体空间电位分布及基片附近等离子体鞘结构，并讨论其对成膜的影响．
The plasma density, electron temperature and plasma potential are measured by Langmuir double probes and an emission probe during synthesis of diamond films with EACVD.The profiles of plasma parameters and the sheath structure near the Substrate are presented.The influence of plasma parameters on the diamond films is also discussed.
出处
《核聚变与等离子体物理》
CAS
CSCD
北大核心
1996年第3期60-64,共5页
Nuclear Fusion and Plasma Physics
基金
国家自然科学基金
