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磁控溅射制备参数对ZnO∶Al光学性能的影响 被引量：2

The Effect of Magnetron Sputtering Growth Parameters on Optical Properties of ZAO
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摘要 ZnO∶A l(ZAO)透明导电薄膜是一种n型半导体,有高的载离子浓度和大的光学禁带宽度,具有优异的电学和光学性能,有极广的应用前景.着重分析了磁控溅射制备参数对光学性能的影响. Transparent conductive ZnO： Al（ZAO） thin films are semi-conductor oxides with both high carrier concentration and large optical band gap. ZAO films have outstooding electrical and optical properties, and axe emerging as a most potential alternative candidate for transparent conducting material. The effect of growth parameters on the optical properties are mostly analysed.
作者 殷胜东 马勇 殷霖
机构地区 重庆师范大学物理学和信息技术学院
出处 《云南民族大学学报（自然科学版）》 CAS 2006年第2期126-129,共4页 Journal of Yunnan Minzu University:Natural Sciences Edition
基金 重庆市教委基金项目(040810)
关键词 ZAO薄膜 光学性能 磁控溅射 ZAO films optical properties magnetron sputtering
分类号 O484 [理学—固体物理]
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参考文献22

  • 1YOO J,LEE J,KIM S,et al.High transmittance and low resistive ZnO:Al films for thin film solar cells [J].Thin Solid Films,2005,480-481:213-217.
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  • 3LEE J H,PARK B O.Transparent conducting ZnO:Al,In and Sn thin films deposited by the sol-gel method[J].Thin Solid Films,2003,426:94-99.
  • 4HIDEAKI A,AKIO S,TATSUHIKO M,et al.Low resistivity transparent conducting Al-doped ZnO films prepared by pulsed laser deposition[J].Thin Solid Films,2003,445:263-267.
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  • 7JEONG S H,BOO J H.Influence of target-to-substrate distance on the properties of AZO films grown by RF magnetron sputtering[J].Thin Solid Films,2004,447-448:105-110.
  • 8HERRMANN D,OERTEL M,MENNER R,et al.Analysis of relevant plasma parameters for ZnO:Al film deposition based on data from reactive and non-reactive DC magnetron sputtering[J].Surface & Coatings Technology,2003,174-175:39-47.
  • 9CHEN M,PEI Z L,SUN C,et al.Formation of Al-doped ZnO films by dc magnetron reactive sputtering[J].Materials Letters,2001,48:194-198.
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云南民族大学学报（自然科学版）
2006年 第2期

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