摘要
用充电曲线——拉普拉斯变换方法获得了抛光液中不同成份在80℃,90℃下的交流阻抗频谱图,配合失重腐蚀速度数据,研究了光亮剂对双电层结构的影响。揭示了在抛光过程中光亮剂通过吸附、沉积、扩散步骤达到试样表面整平、光亮效果。
Alternating Current Impedence diagrams were obtained by Current-step and Laplace transformation in alkaline chemical polishing of aluminum.The datum of corrosive weight loss was also obtained.The influence of bright agent on the structure of electrod was researched.It was proposed that the brighten effect was get by the absorbability,depostion and diffusion of bright agent.
出处
《北京航空航天大学学报》
EI
CAS
CSCD
北大核心
1990年第4期40-45,共6页
Journal of Beijing University of Aeronautics and Astronautics
关键词
化学抛光
光亮剂
交流阻抗
chemical polishing,bright agent,alternating current impedance.
