反应压强变化对Fe:NiO_x阳极催化薄膜性质的影响

The Effect of Reactive Pressure to Fe:NiO_x Film as Anode Catalytic Film in Hydrogen Producing System by Solar Cell

采用磁控溅射法在镍衬底上制备了不同性质的Fe:NiOx薄膜,通过改变反应压强,发现薄膜的催化活性随着压强的增大而提高.进一步利用EDX、XRD、XPS、SEM等分析发现,薄膜的有效表面积、结晶度以及样品中Ni3+的含量都对样品的催化活性有影响.另外对薄膜的透过特性也进行了研究,发现当膜厚超过1000nm后,对波长小于500nm的可见光几乎全部吸收,表现出了很差的透光特性.

By changing the sputtering conditions, Fe：NiOx films with different catalytic behaviors were fabricated. With the increase of working pressure the overpotential in 100 mA·cm^-2 changed from 780 mV at 1.0 Pa to 330 mV at 4.0 Pa. At the same time the Tafel slop also decreased dramatically from 71 mV·dec^-1 to 53 mV·dec^-1. Then by further analysis of EDX, XRD, XPS, SEM, we found that the crystallinity and the effective reactive surface area, especially the content of Ni^3＋, all can affect the catalytic properties. Lastly, we studied the transmittance of Fe：NiOx film in the range of visible light. But as the anode catalytic film, the transmittance of Fe：NiOx film is poor, especially with the increase of depth.