实现多层混合刻蚀薄膜大面积均匀的方法浅探

Novel Methods of Patterning YBaCuO Thin Film Over Large Area

采用多层光刻工艺结合氩离子铣的混合刻蚀方法，刻蚀高Ｔｃ超导ＹＢａＣｕＯ／ＺｒＯ２（１００）薄膜图形，取得了较好的结果。在进行氩离子镜的工艺步骤中，使用普通氩离子铣设备（离子束斑极不均匀），但采取了一定的措施─－使被刻样品在刻蚀台座上可移动，模糊地实现了薄膜的相对＂大面积＂（直径φ≥２０ｍｍ）均匀刻蚀─－可同时刻蚀２～３片６ｍｍ×１０ｍｍ薄膜，并且被刻蚀部分表面起伏约在１０ｎｍ左右。图形样品的最小线条达２μｍ，其Ｔｃ、Ｊｃ人与刻蚀前薄膜的Ｔｃ、Ｊｃ相当，即：ＴＣ为８５～９０Ｋ，Ｊｃ～１０６Ａ／ｃｍ２（在７７Ｋ下）。

For patterning high-Tc superconducting YBaCuO films,good results are obtained by using multilayer chemical wet etching and Ar+ ion milling technique. Especially a series of measures are adopted in Ar+ ion milling process e.g.the worktable is rotatable and translational). And it is achieved that patterning films over large area(≥20 mm)is relatively even. Typical surface roughness of patterned samples is about 10 nm.The 2 μm wide YBaCuO stripline,which shows Tc of 90 K and Jc of 106A/cm'2(77 K),has been fabricated.