摘要
本文提出了以玻璃为基质,以厚感光有机膜为铸模,利用光刻法制作大面积金属场致发射阴极阵列的新方法。对该方法的工艺结果进行了计算机模拟并在现有条件下进行了初步的工艺探索,最后讨论了改进措施。
In this paper a novel method for fabricating large area metal field emission cathode arrays,in which flat glass is used as substrate and thick photosensitive organic film as mold,has been put forward.The result is simulated and the specific process is probed tentatively under our current conditions.Finally,the improvement of the process is discussed.
出处
《电子学报》
EI
CAS
CSCD
北大核心
1996年第11期48-51,共4页
Acta Electronica Sinica
基金
国家自然科学基金
关键词
阴极阵列
场致发射
光刻
Cathode array,Field emission,Photolithography