摘要
采用独特的快速循环纳米晶化技术(RRTA)对直流磁控溅射制备的非晶CoNbZr软磁膜进行纳米晶化。研究了不同的纳米晶化工艺条件下,薄膜的微观结构和软磁性能。结果表明,CoNbZr软磁薄膜晶粒细化到30 nm,RRTA晶化方法可有效地控制CoNbZr薄膜的软磁性能。
The rapid recurrent thermal annealing （RRTA） method has been used to crystallize the amorphous CoNbZr soft magnetic thin films, which were fabricated by DC magnetron sputtering. The structure and soft magnetic properties were investigated using RRTA method with variation parameters. As a result, crystalline grains with diameter of about 30 nm were formed. The experiment results revealed that the RRTA is an effective method to control the magnetic and electrical properties of CoNbZr thin films.
出处
《压电与声光》
CSCD
北大核心
2006年第2期182-184,共3页
Piezoelectrics & Acoustooptics
基金
总装基金资助项目(51412010505DZ0243)
关键词
薄膜
软磁膜
纳米晶化
thin film
soft magnetic thin film
nanocrystalline
