N^+辐照非注入因素对微生物存活率的影响

Effects of non-implantation factors on survival rate of microbe irradiated by low-energy N^+

低能N+辐照EscherichiacoliLE392前非注入因素如干燥、真空及菌悬液室温静置时间对其存活率的影响在本文中进行了研究。结果表明,样品干燥过程中E.coli存活率并非稳步下降,而存在一个瞬间急剧降低的现象;干燥样品放入真空靶室的瞬间,真空对E.coli的致死作用最大,随真空处理时间的增加E.coli存活率虽有下降但不显著;E.coli菌悬液室温放置过程中随时间延长其真空的耐受力也相应增加,分批培养的方法为研究提供了状态一致的新鲜样品,避免了由于注入样品间状态差异所引起的试验误差。在控制非注入因素的条件下,将N+1×1014cm-2和3×1015cm-2注入E.coli后,相同剂量不同批次间E.coli的存活率无显著差异。

The effects of non-implantation factors, such as drying, vacuum and the staying time of the E.coli LE392 culture, on survival rate of E.coli LE392 were studied when E.coli LE392 was irradiated by the low-energy N^＋. The results show that the survival rate of E.coli LE392 does not reduce steadily all the time but rapidly drops sometime during drying. The survival rate of E.coli LE392 declines sharply as the samples are placed in vacuum, then falls indistinctively with increasing of time. The tolerance of E.coli LE392 towards vacuum increasingly strengthens when the E.coli LE392 culture is placed at room temperature. Preparing the culture in batchs can ensure the consistency of the irradiated samples and avoid errors caused by the inconsistent samples. When the non-implantation factors are controlled, E.coli is implanted by 30 keV N^＋ of 1×10^14 cm^-2 and 3×10^15 cm^-2, respectively. And the results show no difference in the E.coli＇s survival rates between batchs at the same dose.