摘要
银表面组装有一系列自组装膜:3-巯基三甲氧基硅烷(3-MPT SAMs)、3-巯基三甲氧基硅烷与十八硫醇混合自组装膜(SAMM)以及两者之上分别自组装有乙烯基咔唑与甲基丙烯酸乙脂共聚物的复合自组装多层膜(CSAF(Ⅰ)和CSAF(Ⅱ)).这些惰性膜可作为金属表面的隔绝层.使用电化学阻抗(EIS)技术和X射线衍射(XRD)技术分析了表面修饰有这些自组装膜的银在10%氢氧化钠水溶液中的氧化阻力及其影响因素,发现自组装膜的存在不同程度地抑制了银表面的氧化反应,氧化过程存在2个以上时间常数.
Self-assembled monolayers （SAMs） of （3-mercaptopropy） trimethoxysilane （3-MtrF） chemisorbed on silver surfaces were chemically ＂modified by 1-octadecanethiol to form self-assembled mixed-monolayers （SAMM） and the co-polymer of N-vinylcarbazole and methyl methacrylate ester （to form complex selfassembled film （CSAF））. The oxidation resistance of these barriers on silver surfaces and some influential factors concerned processes were analyzed by electrochemical impedance spectroscopy （EIS） in a 10% NaOH aqueous solution at oxidation potential. X-ray diffraction （XRD） spectroscopy shows that the oxidation occurring on the silver surface may be restrained effectively due to the coating barrier, and CSAF（Ⅱ） is the best one. Studies also reveal that oxide processes of bare silver and a series of modified silver electrodes in a 10% NaOH aqueous solution are of more than two relaxation time constants.
基金
The National Natural Science Foundation of China(Nos.60371027,60171005).
关键词
电化学阻抗
X射线衍射
复合自组装膜
银
electrochemical impedance
X-ray diffraction
complex self-assembled multilayer
silver
