摘要
通过利用突变结PIN理想结构电场分布模型,分析了该结构发光二极管(LED)反向击穿电压与非故意掺杂有源区厚度的线性相关性。通过利用LP-MOCVD技术生长了不同厚度多量子阱(MQW)有源区AlGaInP LED,测量了器件的反向击穿特征,测试结果与理论分析非常吻合。同时获得了AlGaInPMQW结构的临界反向击穿电场强度数值。这些结果可以作为具有PIN结构的LED性能优化的重要参考。
The linear relation between the reverse breakdown voltage and un-doping active region's thickness of PIN light emitting diode(LED) was analyzed by using the ideal PIN structure's electric field distribution model. LEDs with varied un-doping multi-quantum wells (MQWs) active region thickness were grown with LP-MOCVD,and the breakdown voltage was confirmed to be linear with the thickness of the un-doping active region. At the same time,the critical breakdown electric intensity of AIGalnP MQW structure was obtained. The results were very useful during the optimizing process for the PIN LED's structure.
出处
《光电子.激光》
EI
CAS
CSCD
北大核心
2006年第4期506-508,共3页
Journal of Optoelectronics·Laser