期刊文献+

同心扫描法制作凹球面等距网栅的误差分析 被引量:2

Error analysis of fabricating isometric mesh on the concave of a spherical substrate by concentric optical scanning
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摘要 纬线与纬线相交可形成球面等距网栅,而采用“同心扫描”的运动方式可在凹球面上生成纬线。“同心扫描”要求直写物镜光轴、直写物镜水平转轴、工件回转轴和工件分度轴四轴交于工件凹面球心。采用两两相交误差几何分析的方法,得到了同心误差与离焦量和栅距误差的变化关系:随着同心误差增加,系统离焦量和栅距误差也增加,且二者的变化趋势基本一致。因为网栅线宽一般要求达到微米量级,与之匹配的栅距则往往为几百微米,所以栅距误差与栅距相比可以忽略,系统离焦量对网栅线宽的影响却必须认真考虑。采用几何光学基本公式对物镜系统的进一步分析表明,为了制作细且均匀的网栅线条,必须采用小光斑,而小光斑对应的焦深也小,从而要求离焦量小,对同心误差要求严格;反之,则可放宽对同心误差的要求。 An isometric mesh on the concave of a spherical substrate was formed by latitude line intersection each other, in which latitude lines was generated by a concentric optical scanning method. An optical axis, erection turning spindle, horizontal dividing spindle and a pitching dividing spindle were positioned on the concave center of the spherical substrate in concentric scanning. The concentric error between these spindles with the concave center may bring on the defocus of optical system and the error of the mesh period, but because the ratio of the period error to the period is very small, the latter may be ignored. The theoretical analytical result shows that the line width of mesh is restricted by the dimension of focal spot and the defocus of optical system determines the smallest dimension of focal spot, so the line width of mesh is restricted by the concentric error,i, e. the smaller the concentric error is, the smaller the line width is also.
出处 《光学精密工程》 EI CAS CSCD 北大核心 2006年第2期251-255,共5页 Optics and Precision Engineering
基金 国防科技预研基金项目(No.10.4.2ZK1001)
关键词 滤波器 电磁屏蔽 光刻 金属网栅 球面 filter electromagnetic shietd lithography metallic mesh sphere surface
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参考文献15

  • 1MUNK B A.Frequency selective surface:theory and design[M].A Wiley-Interscience Publication.2000.
  • 2高劲松,孙连春,郑宣明,朱世栋,赵晶丽.红外透明导电金属网栅薄膜[J].光学技术,2001,27(6):558-559. 被引量:16
  • 3ULRICH R.Far-infrared properties of metallic mesh and its complementary structure[J].Infrared Physics,1967,7:37-57.
  • 4KOHIN M.Analysis and design of transparent conductive coatings and filters[J].Opt.Eng.,1993,35(5):911-925.
  • 5NOLL R J.Some trade issues for EMI windows[J].SPIE,1994,2286:403-410.
  • 6MIAS C,TSOKONAS C,OSWALD C.An investigation into the feasibility of designing frequency selective windows employing periodic structures[C].Technical Reports AY3922,The Nottingham Trent University,Burton Street,Nottingham,NG1 4BU,U.K.,2002.
  • 7洪伟,章文勋.分析无限平面金属栅电磁散射问题的一种新方法[J].电子学报,1992,20(3):47-51. 被引量:8
  • 8徐则川,李义兵.一维周期金属栅的电磁特性[J].华中理工大学学报,1997,25(1):60-62. 被引量:3
  • 9冯晓国,方梁,孙连春.金属网栅结构参数设计与制作[J].光学精密工程,2005,13(1):59-64. 被引量:23
  • 10GEBART B R.Permeability of unidirectional reinforcements for RTM[J].Journal of Composite Materials,1992,26(8):1100-1133.

二级参考文献24

  • 1天民波 刘令德.薄膜科学与技术手册(第一版)[M].北京:机械工业出版社,1991..
  • 2RIZVI S A. National Technology Roadmap for Semiconductors: An Analysis and Perspective [J]. SPIE, 1998, 3331:190-196.
  • 3LEVENSON M D. Wavefront Engineering from 50nm to 100nm CD [J]. SPIE, 1997, 3051: 2-13.
  • 4FINDERS J, JORRITSMA L, EURLINGS M, et al. Can DUV Take Us Below 100nm[J]. SPIE, 2001, 4346:153-165.
  • 5WAGNER C, KAISER W, MULKENS , et al. Advanced Technology for Extending Optical Lithography [J]. SPIE, 2000,4000:344-3.57.
  • 6FLAGELLO D G, MULKENS J, WAGNER C. Optical Lithography into the Millennium: Sensitivity to Aberrations,Vibration and Polarization [J]. SPIE, 2000, 4000:172-183.
  • 7YEUNG M. Modeling High Numerical Aperture Optical Lithography [J]. SPIE, 1988, 922:149-167.
  • 8FLAGELLO D G, ROSENBLUTH A E, PROGLER C, et al. Understanding High Numerical Aperture Optical Lithography [J].Microelectronic Engineering, 1992, 17:105-108.
  • 9洪伟,电子科学学刊,1987年,4期
  • 10Chen C C,IEEE Trans AP,1970年,18卷,9期,660页

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