摘要
超微粒照相干版是用于生产大规模集成电路的重要工具,在研制过程中解决了“超微粒”、“超洁净”、“超平整度”三项主要技术难关。本项研究工作曾获得北京市科学技术成果一等奖。
High resolution （Ultra-fine grains）photographic phte is a key device for making Large-scale integrated circuit.During the exploration of the production technology of this kind of photographic plate,three delicate technical problems must be overcome in advance,i.e, ultra-fine grains,ultra-high cleanness and ultra-high flatness.This paper presents a summary Qf this study which was awarded a first chss prize of 《Beijing Scientific ＆ Technological Achievements》in 1979.
出处
《影像技术》
CAS
2006年第2期14-18,共5页
Image Technology
关键词
超微粒照相干版
超解像力
超洁净度
high resolution photographic phte,ultra-high resolving power
ultra-high cleannes
