期刊文献+

液相沉积类金刚石膜的沉积机理研究 被引量:2

Study on deposition mechanisn of diamond-like carbon films prepared by liquid-deposition
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摘要 根据电化学的相关理论,提出了钛合金表面液相沉积DLC膜的反应机理,给出了可能电极过程,认为膜是通过甲基阳离子的亲电取代反应而不断生长。讨论了氢原子对金刚石结构的稳定作用,并解释了实验条件对膜结构和性能的影响。 Deposition mechanism of DLC films prepared by liquid-deposition is suggested according to the theory of electro-chemistry.Electro-chemic equations are listed.The effect of hydrogen on stability of diamond and the influences of deposition condition on properties of DLC films are discussed.
出处 《化学工业与工程技术》 CAS 2006年第2期9-12,共4页 Journal of Chemical Industry & Engineering
基金 江苏省基础研究计划(自然科学基金)资助项目 项目编号:BK2001414
关键词 类金刚石膜 电化学 亲电取代 Diamond-like carbon films Electro-chemistry Electrophilic substitution
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参考文献7

  • 1Aisenberg S,Chabot R.Ion-beam deposition of thin films of diamond-like carbon[J].Journal of applied physics,1971,42(7):2 953
  • 2Weissmantel C,Bewilogua K,Dietrich D,et al.Structure and properties of quasi-amouphous films prepared by ion beam techniques[J].Thin Solid Films,1980,72(1):19~31
  • 3Liu D P,Yu S J,Liu Y H,et al.Deposition of diamondlike carbon films by barrier discharge plasma with 1.4and 20 kHz power sources[J].Thin Solid Films,2002,414:163~169
  • 4Sun Z,Sun Y,Wang X.Investigation of phases in the carbon film deposited by electrolysis of ethanol liquid phase using Raman scattering[J].Chemical Physics Letters,2000,318:471~475
  • 5Wang H,Yoshimura M.Electrodeposition of diamondlike carbon films in organic solvents using a thin wire anode[J].Chemical Physics Letters,2001,348:7~ 10
  • 6王季陶,张卫,刘志杰.金刚石低压气相生长的热力学耦合模型[M].北京:科学出版社,2000
  • 7Cao C B,Zhu H S,Wang H.Electrodeposition diamond-like carbon films from organic liquids[J].Thin Solid Films,2000,368:203~207

同被引文献19

  • 1刘贵昂.类金刚石膜及其淀积条件的研究[J].大自然探索,1998(4):72-75. 被引量:5
  • 2赵蕾,付永辉,刘登益,朱晓东,何家文.离子束辅助磁控溅射制备类石墨碳膜的结构与性能研究[J].无机材料学报,2005,20(1):181-186. 被引量:7
  • 3徐均琪,杭凌侠,惠迎雪.非平衡磁控溅射无氢DLC增透膜的研制[J].真空,2005,42(5):22-25. 被引量:8
  • 4刘艳红,张家良,王卫国,李建,刘东平,马腾才.CH_4或CH_4+Ar介质阻挡放电中的离子能量和类金刚石膜制备[J].物理学报,2006,55(3):1458-1463. 被引量:10
  • 5RobertsonJ. Nitrogen doping of tetrahedral amorphous carbon Diamcod Relat[J].Mat.Sci.Eng.R,1995,4 (10):441-444.
  • 6B Richard, Jackman, J Beckman,et al. Diamond chemical vapor deposition from a capacitively coupled radio frequency plasma[J]. Appl. Phys. Lett,1995, 66:1018-1022.
  • 7KatsunoT, NittaS, UedaK. New preparation method of diamond like carbon the layer by layer method[J]. Journal of Non - Crystalline Solid, 2002,299 : 830 - 834.
  • 8B RUF, F BEHRENDT, O DEUTSCHMANN, et al. Simulation of Homoepitaxial Growth on the Diamond (100) Surface Using Detailed Reaction Meehanisms[J]. Surface Science, 1996,3522354: 602 - 606.
  • 9D R Alfonso,E Ulloa. Molecular dynamics simulations of methyl radical deposition on diamond (100) surfaces[J]. Phys. Res. B, 1993, (48) : 12235 - 12239.
  • 10W J Zhu,Z Y Pan,et al. Molecular dynamics simulation of C2H2 deposition on diamond (001) - (2×1)surface {J]. Eur. Phys, 1999, (5) : 83 - 88.

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