摘要
基于氧化锌薄膜紫外光发光的实现,ZnO薄膜成为新的研究热点。综述了各种沉积条件对脉冲激光沉积(PLD)技术生长的氧化锌薄膜的微结构、光学和电学性质的影响,ZnO薄膜的厚度在超过400 nm时,呈现出了近似块状的性质。采用PLD技术,可以在适当的条件下制备具有特定功能的氧化锌薄膜。
Reviewed were the effects of various deposition conditions on microstructural, optical and electrical properties of ZnO films grown by pulsed laser deposition （PLD） technology. It is believed that ZnO films thicker than 400 nm are almost strain-free and exhibit near-bulk ZnO properties. ZnO films with special function can be grown under proper conditions by PLD.
出处
《电子元件与材料》
CAS
CSCD
北大核心
2006年第5期9-12,共4页
Electronic Components And Materials
基金
国家自然科学基金资助项目(No.90301002
90201025)
