中频对靶磁控溅射制备含铬类金刚石薄膜

Investigation on Cr-doped diamond-like carbon films prepared by mid-frequency dual-magnetron sputtering

利用新型中频对靶磁控溅射在硅和M2高速钢基体上沉积了一系列无氢含铬类金刚石膜。考察了类金刚石膜的表面形貌、显微结构、硬度、结合力和摩擦磨损性能。结果表明:合成的类金刚石薄膜具有优良的综合性能,硬度为30-46GPa、结合力Lc达50-65N、大气环境下摩擦系数约为0.1。

The hydrogen-free diamond-like carbon (DLC) films were deposited on substrates of Si and M2 high-speed steel using a new mid-frequency dual-magnetron sputtering. The microstructure and properties of DLC film including surface morphology, hardness, adhesion, friction and wear behavior were investigated. The results indicate that the films have good comprehensive performance, i.e., high hardness of 30-46 GPa, good adhesion of critical load 50-65 N, and friction coefficient about 0.1 in air condition.