退火温度对碳氮薄膜的纳米力学和纳米摩擦性能的影响

Nano- Mechanical Properties and Nano- Tribological Behaviors of the CNx Films Annealed at Different Temperatures

采用微波电子回旋共振化学气相沉积技术制备了氮含量不同的碳氮薄膜，采用真空退火技术对碳氮薄膜进行了退火处理，并且利用Laser Raman谱仪和Hysitron纳米力学测试系统对碳氮薄膜的结构、纳米力学以及纳米摩擦特性进行了研究。结果表明：随着退火温度的升高，碳氮薄膜中的sp^2含量降低，sp^2含量增加，而薄膜的纳米力学性能如纳米硬度和弹性模量则随之明显下降。在栽荷相同的条件下，不同氮含量的沉积态碳氮薄膜均表现出基本相同的摩擦系数值。但退火处理会显著改变碳氮薄膜的摩擦系数，氮含量相同时，退火温度越高，摩擦系数越大。但是，摩擦系数随退火温度增大的程度与薄膜中氮含量有关。

CNx films having different nitrogen contents were prepared by an ECWR - CVD deposition technique and vaccum - annealed at different temperatures. The structures, nano - mechanical properties and nano - tribological behaviors of the annealed CNx films were characterized using Laser Raman Spectroscopic technique and Hysitron Triboindenter, respectively. The annealing temperature promotes the increase in the sp2 ratio and decreases evidently the nano - mechanical properties, including nano - hardness and reduced modulus. For the as - deposied CNx films with different nitrogen contents, the frictional coefficients （ LF/NF） deduced from nano - scratch testing at same loads are similar, and, therefore, seem to be independent of the added nitrogen content. However, Annealing treatment has a significant effect on the frictional coefficient for the CNx films. In addition, the increasing extent of the frictional coefficient with the annealing temperature for the annealed CNx films varies depending on the nitrogen content in the films.