摘要
研究了计算机控制小工具抛光(CCOP)加工中三种常用的磨盘材料对去除函数特性的影响,进一步完善材料去除模型,用以指导光学零件的加工。利用自行研制的AOCMT光学加工机床及接触式测量系统进行实验和分析。从去除函数形状、去除效率及稳定性、表面形貌三个方面进行了研究。实验结果表明:聚氨酯材料适用于粗抛光阶段;阻尼布材料适用于精抛光阶段;沥青材料适用于最后的修形加工和表面处理。
The effect of the three kinds of material on the removal function is studied. The considering properties of the removal function include the removal profile, the removal rate, the stability of the removal function and the surface topography. A series of expe6.ments have been done to the perfect properties of the removal function. The experiments were done on the AOCMT machine tool and the contact measurement system developed by ourselves. The results were presented as follows. Polyurethane is used in the step of the rough polish. Polishing cloth is used in the step of the finishing polish. Polishing pitch （55 # polishing pitch by GuGolz Corporation ） is used in the steo of the surface treatment or the finishing polish.
出处
《国防科技大学学报》
EI
CAS
CSCD
北大核心
2006年第2期97-101,共5页
Journal of National University of Defense Technology
基金
国家自然科学基金资助项目(50375156)
关键词
CCOP
去除函数
聚氨酯
阻尼布
沥青
CCOP
the removal function
polyurethane
polishing cloth
polishing pitch
