低温磁控溅射与普通多弧离子镀TiN薄膜的摩擦学性能比较

A Comparison of the Tribological Properties Between Low Temperature Magnetic Sputtering and Multi-arc Ion Plating TiN Films

采用低温磁控溅射和普通多弧离子镀分别在冷作模具钢基体上制备了TiN薄膜,用纳米压痕法测量了薄膜的表面硬度,并比较了低温磁控溅射与普通多弧离子镀TiN薄膜的摩擦学性能。试验表明,低温磁控溅射TiN薄膜具有与普通多弧离子镀TiN薄膜相近的表面硬度,在多种试验条件下,低温磁控溅射TiN薄膜都有较好的摩擦学性能,摩擦副的磨损率低,摩擦因数小且变化平稳,磨损表面光滑。

This paper focused on the preparation of TiN films on ASSAB DF-2 substrate using low-temperature magnetic sputtering technique and multi-arc ion plating technique respectively. Nano-indentation tests were performed to measure the surface hardness of the films using different techniques. A comparative analysis of tribological properties was made for the TiN films prepared by two techniques. The analysis results showed that the TiN films by different techniques had the similar surface hardness. Under different testing conditions, the TiN film prepared by low-temperature magnetic sputtering technique exhibited better tribological properties, lower wear rate, smaller and steadier friction coefficient and smoother wear surface than the TiN film using multi-arc ion plating technique.