磁控溅射TiN薄膜低温沉积技术及其摩擦学性能研究

Study of Low Temperature Deposition of Magnetic Sputtering TiN Films and their Tribological Properties

利用磁控溅射装置在高速钢基体上制备了TiN薄膜,研究了基体温度升高的原因及其磁控溅射的低温原理,讨论了低温与离子刻蚀、负偏压、磁场强度3个主要溅射工艺参数的关系,并对TiN薄膜的摩擦学性能进行了研究。实验结果表明,离子刻蚀、负偏压、磁场强度对低温磁控溅射TiN成膜过程具有较大的影响,所制备的TiN薄膜的耐磨性、配副适应性也较好。

The preparation of TiN films on HSS substrate using magnetic sputtering was investigated. The reasons for the rise of substrate temperature and the principle of low temperature magnetic sputtering were presented. A series of experiments were conducted to study the relationship between low temperature and three major sputtering technological parameters, that is, ion etching, negative bias voltage and magnetic-field intensity. Experimental results indicate that ion etching, negative bias voltage and magnetic-field intensity have a great effect on the preparation of TiN films using low temperature magnetic sputtering. The TiN films prepared in this approach are rewarded good wear resistance and matching adaptability as a part of rubbing pairs.