摘要
采用直流电弧等离子喷射(DCarc plasma jet)CVD(chemical vapour deposition)工艺制成的金刚石薄膜,研制成功MSM(metal-semiconductor-metal)型CVD金刚石脉冲辐射探测器.对制作的金刚石薄膜材料及探测器有关性能进行了测量,结果表明,采用Raman shift<4.5cm-1的金刚石薄膜制成的探测器,可满足亚纳秒脉冲辐射探测的要求.由于其独特的物理性能,在制作成本合理的情况下,在脉冲辐射测量中可取代Si-PIN探测器.
Detector grade diamond films have been prepared by DC Arc Plasma Jet chemical vapour deposition from CH4-H2 mixtures. Diamond detectors of pulsed radiation based on the films have been developed and preliminarily studied. The responses of the detector to 1.25MeV γ ray and pulsed ultraviolet laser with picosecond width show that this detector has a very fast time-response and about 70% charge collection efficiency. Its further applications will be found in sub-nanosecond pulse measurements.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2006年第5期2170-2174,共5页
Acta Physica Sinica