含氟聚酰亚胺接枝低聚倍半硅氧烷制备超低介电材料

Ultra-low-ε Nanocomposites of Novel Fluorinated Polyimides Grafted with Polyhedral Oligomeric Silsesquioxane

通过热引发甲基丙烯酸环戊基-立方低聚倍半硅氧烷（R7R′Si8O12或POSS）（MA-POSS）与臭氧预处理的含氟聚酰亚胺（6F-Durene）自由基接枝共聚制得6F-Durene共价接枝包含立方低聚倍半硅氧烷（POSS）的聚甲基丙烯酸酯（PMA）支链的纳米复合物. 用核磁共振（NMR）、X射线衍射（XRD）和场发射扫描电子显微镜（FESEM）等测试技术分别对POSS/6F-Durene纳米复合物进行了结构表征及形貌观察. POSS/6F-Durene纳米复合物薄膜与未接枝的6F-Durene薄膜相比具有更低的介电常数ε（在2.5～2.0范围内）.

Nanoeomposites of 6F-Durene with covalently grafted polymethacrylate（PMA） side chains containing polyhedral oligomeric silsesquioxane （R7R′ Si8 O12 or POSS ） units were prepared by means of the thermally-initiated free-radical graft polymerization of methacrylcyclopentyl-POSS （MA-POSS） with ozonepretreated 6F-Durene. The chemical composition and the structure of the 6F-Durene with grafted methacrylcyclopentyl-POSS side chains（ POSS/6F-Durene copolymers） were characterized by nuclear magnetic resonance （ NMR）, X-ray diffraction（XRD） and field-emission scanning electron microscopy（FESEM）. The POSS/6F- Durene nanoeomposite films had both lower and tunable dielectric constants（ε′s） in comparison with the pristine 6F-Durene films, with values between 2. 0 and 2.5.